TF-LFA

Thermal conductivity / thermal diffusivity measurements: 80 nm - 20 µm

Description

To the point

Determining the thermo-physical properties of materials and optimizing heat flows in end products is becoming increasingly important for many industrial applications.

For this reason, the flash method has become the most commonly used technique for measuring the temperature and thermal conductivity of various solids, powders and liquids in recent decades.

In the age of nanotechnology, more and more industries and users now require precise measurement data for very thin layers.
The semiconductor industry with typical products such as light-emitting diodes (LEDs), phase-change memories or flat screens has the greatest demand.
Several layers of different materials are often deposited on a substrate in order to create a component with a specific function.

Since the physical properties of thin films usually differ from those of a solid material, their characterization is essential for the design and optimization of thermal management.

Based on the proven laser flash technology, the Linseis Laserflash for Thin Films (TF-LFA) now offers a whole range of new possibilities for analyzing the material data of thin films with a thickness of 80 nm to 20 µm.

Thermal properties:

Thin films:

Thin films are materials with a thickness of nanometers to micrometers that are applied to surfaces.
Their thermophysical properties differ considerably from those of bulk materials and depend on thickness and temperature.
Thin films are generally used in semiconductors, LEDs, fuel cells and optical storage media.

Different types of thin films

  • Thin film: layer from a few nm to µm
  • Layers are grown on a special substrate
  • Typical growth techniques are
    • PVD (e.g. sputtering, thermal vaporization)
    • CVD (PECVD, LPCVD, ALD)
    • Drip casting, centrifugal coating and pressure
  • Many different types of layers, including:
    • Semiconductor layers (e.g. thermoelectric, sensors, transistors)
    • Metallic layers (used as contacts)
    • Thermal barrier coatings
    • Optical coatings

Multilayer sample

Thin film (e.g. semiconductor, metal, organic, oxide) Substrates (e.g. Si, Si3N4, Fused Silicia)

FDTR
Frequency Domain

FDTR is a non-contact method for characterizing the thermal properties of thin films in the frequency range using the effect of thermoreflectance to create a highly sensitive thermometer for measuring the surface temperature of the sample by monitoring the reflectivity.
A continuous wave laser (probe laser) with a wavelength of 532 nm is used for this purpose, while a harmonically modulated pump laser with a different wavelength (405 nm) is used.

Local heating leads to changes in reflectivity, and the phase delay between thermal excitation and detection is measured with a lock-in amplifier.
Modeling the response in the frequency domain with a diffusive heat transport model allows the determination of thermal conductivity, volumetric heat capacity, thermal diffusivity, thermal efficiency and thermal interface conductance.

A thin metallic transducer layer (60-70 nm thick) is applied to the surface of the samples to increase the temperature coefficient of reflection, dR/dT, and at the same time reduce the optical penetration depth into the material.

Advantages:

  • Wider measuring range
  • Easier handling
  • Greater stability
  • More precise results
  • Possibility to measure the thermal contact resistance between two layers
  • No more assumptions about heat capacity and density of thin sample layers

Comparison of FDTR and TDTR methods

Our advanced FDTR (Frequency-Domain Thermoreflectance) system offers significant advantages over the conventional TDTR (Time-Domain Thermoreflectance) method by optimizing the setup and increasing measurement stability.

The probe laser does not need to be adjusted: In contrast to the TDTR arrangement, where the probe laser has to be adjusted relative to the sample because the reflection changes slightly when the sample changes, our FDTR system eliminates this need.
Our system has an automatic focusing system that continuously adjusts the focus of the probe laser to any changes in the sample, thus ensuring optimum measurement conditions without manual intervention.

Aligned lasers: Thanks to the perfectly aligned lasers in our FDTR system, the probe laser beam does not need to be adjusted, resulting in easier sample set-up and more stable measurements.

Unique features

Comprehensive thermal characterization:

  • Measurement of thermal conductivity,
    heat capacity, thermal diffusivity and
    thermal effusivity
  • Determination of the thermal contact
    between two neighboring layers
  •  

Anisotropy function:

  • Optional function for measuring the thermal
    conductivity both in the direction of passage
    (through the material) and in the plane
    (perpendicular to the laser excitation)

Wide temperature range:

  • The device can measure the thermal properties
    of thin films at room temperature up to 500°C

Thermal imaging:

  • With the optional sample
    mapping function, the thermal
    properties of the sample can be
    tracked over a specific area or
    points of the surface, ideal for
    homogeneity tests

Automatic optimization and camera option:

  • Automatic optimization of the laser beam
    to improve the measurement results
  • Additional camera option that provides
    visual information and facilitates the selection
    of interesting spots on the sample surface

Measurement of thermal contact
resistances/conductive values
:

  • Measurement of the thermal
    contact between two layers,
    e.g. between sample and surface
    or sample and transducer layer

Service hotline

+01 (609) 223 2070

 

+49 (0) 9287/880 0

Our service is available Monday to
Thursday from 8 am to 4 pm
and Friday from 8 am to 12 pm.

We are here for you!

Specifications

Black on white

MODEL

TF-LFA

Sample dimensions:Any shape with a side length between 2mm and 25mm
Thin-film samples:10nm up to 20μm*
(depending on the sample)’
Temperature range:RT, RT up to 200/500°C
sample holder for 4‘’ wafer (RT only)
Measured properties:Thermal conductivity
Temperature conductivity
Thermal surface resistance
Volumetric specific heat capacity
Thermal capacity
Options:Anisotropy:
Measurement of thermal properties across and in-plane

Sample imaging:
Scanning of multiple sample positions in a point-by-point or group-wise fashion. Mapping area: 10 mm²
Step size: 50 µm

Camera:
Enables the user to view the current sample surface and the position of the laser beams in order to capture the actual measurement position.
Atmospheres:inert, oxidising or reducing
vacuum up to 10E-4
Measuring range for diffusivity:0.01mm2/s up to 1200mm2/s (depending on the sample)
Pump laser:CW laser (405 nm, 300 mW,
modulation frequency up to 200 MHz)
Probe laser:CW laser (532 nm, 25 mW)
Photodetector:Si avalanche photodiode, active diameter: 0.2 mm, bandwidth: DC - 400MHz
Power supply:AC 100V ~ 240V, 50/60 Hz, 1 kVA
Software:Included. Software package for calculating thermophysical properties through multi-layer analysis
*Specs depend on configurations

Data sheet

Software

Making values visible and comparable

All LINSEIS thermoanalytical devices are PC-controlled, the individual software modules run exclusively under Microsoft® Windows® operating systems.
The complete software consists of 3 modules: temperature control, data acquisition and data evaluation.
As with other thermoanalytical experiments, the LINSEIS software offers all the essential functions for preparing, carrying out and evaluating the measurements.
Thanks to our specialists and application experts, LINSEIS has succeeded in developing this easy-to-understand and highly practical software.

General software

  • Fully compatible with MS® Windows™
  • Data security in the event of a power failure
  • Evaluation of the current measurement
  • Comparison of the curves
  • Storage and export of evaluations
  • Export and import of ASCII data
  • Data export to MS Excel

Evaluation software

  • Determination of the contact resistance
  • Multi-layer heat transfer model for simultaneous determination of thermal conductivity, thermal diffusivity, thermal efficiency and volumetric heat capacity
  • Checking the feasibility of the
  • Measurement
    Sensitivity diagram

Measuring software

  • Simple and user-friendly parameter input for temperature control, gas control, etc.
  • Software automatically displays a corrected measurement according to the pulse
  • Fully automatic measurement

Applications

Application example: SiO2 thin film 504 nm

Aluminum nitride AIN 200 nm

Application example: Aluminum nitride AIN

Nitruro de aluminio AIN 800 nm

Nitruro de aluminio AIN 1600 nm

Well informed

Downloads

Everything at a glance